Search results for " MOCVD"

showing 10 items of 12 documents

Ultrathin and nanostructured ZnO-based films for fluorescence biosensing applications

2011

The fluorescence-based sensing capability of ultrathin ZnO-SiO(2) nanoplatforms, deposited by an integrated approach of colloidal lithography and metal organic chemical vapor deposition, has been investigated upon adsorption of fluorescein-labeled albumin, used as model analyte biomolecule. The protein immobilization process after spontaneous adsorption/desorption significantly enhances the green emission of the different ZnO-based films, as evidenced by scanning confocal microscopy, corresponding to a comparable protein coverage detected by X-ray photoelectron spectroscopy. Moreover, experiments of fluorescence recovery after photobleaching evidence that the protein lateral diffusion at th…

MOCVD–colloidal lithography; Protein adsorption; Fluorescence recovery after photobleachingMaterials scienceSilicon dioxideMOCVD-colloidal lithographyZnO thin film; MOCVD-colloidal lithography; Biosensing; Protein adsorption; Fluorescence recovery after photobleachingProtein adsorptionNanotechnologyBiointerfaceBiosensing TechniquesChemical vapor depositionFluorescenceFluorescence recovery after photobleachingBiomaterialschemistry.chemical_compoundColloid and Surface ChemistryAdsorptionX-ray photoelectron spectroscopyAlbuminschemistry.chemical_classificationBiosensingBiomoleculeMOCVD–colloidal lithographyMembranes ArtificialZnO thin filmSilicon DioxideNanostructuresSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialschemistryFluoresceinZinc OxideBiosensorProtein adsorptionJournal of Colloid and Interface Science
researchProduct

Metallic interconnects for SOFC: Characterisation of corrosion resistance and conductivity evaluation at operating temperature of differently coated …

2007

Abstract One of challenges in improving the performance and cost-effectiveness of solid oxide fuel cells (SOFCs) is the development of suitable interconnect materials. Recent researches have enabled to decrease the operating temperature of the SOFC from 1000 to 800 °C. Chromia forming alloys are then among the best candidates for interconnects. However, low electronic conductivity and volatility of chromium oxide scale need to be solved to improve interconnect performances. In the field of high temperature oxidation of metals, it is well known that the addition of reactive element into alloys or as thin film coatings, improves their oxidation resistance at high temperature. The elements of …

Materials Chemistry2506 Metals and AlloysMaterials science020209 energyOxideEnergy Engineering and Power TechnologyMineralogychemistry.chemical_element02 engineering and technology[CHIM.INOR]Chemical Sciences/Inorganic chemistryengineering.materialCorrosionchemistry.chemical_compoundASROperating temperatureCoatingElectrochemistry0202 electrical engineering electronic engineering information engineeringSOFCElectrical and Electronic EngineeringPhysical and Theoretical ChemistryThin filmRenewable Energy Sustainability and the EnvironmentMetallurgyASR; Interconnect; MOCVD; Reactive element; SOFC; Electrochemistry; Fuel Technology; Materials Chemistry2506 Metals and Alloys; Energy (miscellaneous)[ CHIM.INOR ] Chemical Sciences/Inorganic chemistry[CHIM.MATE]Chemical Sciences/Material chemistryYttrium021001 nanoscience & nanotechnologyChromiaFuel Technologychemistry[ CHIM.MATE ] Chemical Sciences/Material chemistryInterconnectMOCVDengineeringSolid oxide fuel cell0210 nano-technologyReactive elementEnergy (miscellaneous)Journal of Power Sources
researchProduct

Faceting and structural anisotropy of nanopatterned CdO(110) layers

2005

CdO(110) layers with a self-organized surface structure have been grown on (10math0) sapphire (m plane) substrates by metal-organic vapor phase epitaxy. The epitaxial relationships between layer and substrate have been determined and a crystallographic model that accounts for the CdO in-plane orientation, which results in a reduced lattice mismatch when the CdO[001] direction is perpendicular to the sapphire c axis, has been proposed. Although the measured lattice parameters indicate that the layers are almost fully relaxed, an anisotropic mosaicity is detected with symmetrical rocking curves attaining minimum values when measured along the CdO[math10] direction. The layer morphology consis…

Materials scienceGeneral Physics and AstronomySemiconductor growthEpitaxyMosaicityVapour phase epitaxial growthCadmium compound ; Semiconductor epitaxial layers ; II-VI semiconductors ; Semiconductor growth ; Vapour phase epitaxial growth ; MOCVD ; Nanopatterning ; Self-assembly ; Lattice constants ; Mosaic structure ; Surface morphologyLattice constant:FÍSICA [UNESCO]PerpendicularMetalorganic vapour phase epitaxyAnisotropyCondensed matter physicsUNESCO::FÍSICASemiconductor epitaxial layersLattice constantsNanopatterningII-VI semiconductorsSelf-assemblyFacetingCrystallographyCadmium compoundMOCVDSapphireSurface morphologyMosaic structure
researchProduct

Effect of reactive ion beam etching on the photoluminescence of CdTe epitaxial layers

2008

http://link.aip.org/link/?JAPIAU/103/056108/1

Materials sciencePhotoluminescenceSapphireSpectral line intensityCadmium compoundsIon platingAnalytical chemistryUNESCO::FÍSICASemiconductor epitaxial layersGeneral Physics and AstronomyII-VI semiconductorsEpitaxyAcceptorVapour phase epitaxial growthEtchingEtching (microfabrication):FÍSICA [UNESCO]Ion beam assisted depositionMOCVDSapphireCadmium compounds ; Etching ; II-VI semiconductors ; Impurities ; Ion beam assisted deposition ; MOCVD ; Photoluminescence ; Sapphire ; Semiconductor epitaxial layers ; Spectral line intensity ; Vapour phase epitaxial growthMetalorganic vapour phase epitaxyIon beam-assisted depositionPhotoluminescenceImpurities
researchProduct

High Performance Solar Blind Detectors based on AlGaN grown by MBE and MOCVD

2004

ABSTRACTSolar blind detectors based on AlGaN grown by Molecular Beam Epitaxy and Metal Organic Vapor Phase Epitaxy have been fabricated and characterized. Metal Semiconductor Metal (MSM) detectors and vertical Schottky detectors have been realized, with a design that allows back side illumination. The growth was optimized in order to improve the layer quality, avoid crack formation, and provide the best detector performance. The technological process was also optimized in order to reduce the dark currents and improve the spectral rejection ratio, which is a key factor for solar blind detection. As a result, a rejection ratio of 5 decades between the UV (below 300 nm) and 400 nm, and a steep…

Materials sciencebusiness.industryAlloyDetectorPhase (waves)Schottky diodeengineering.materialEpitaxySettore ING-INF/01 - ElettronicaGanCondensed Matter::Materials ScienceOpticsSolar-blind detectors MBE MOCVD AlGaNengineeringOptoelectronicsMetalorganic vapour phase epitaxybusinessNoise-equivalent powerMolecular beam epitaxyMRS Proceedings
researchProduct

Opportunity of metallic interconnects for ITSOFC : Reactivity and electrical property.

2006

International audience; Iron-base alloys (Fe-Cr) are proposed hereafter as materials for interconnect of planar-type intermediate temperature solid oxide fuel cell (ITSOFC); they are an alternative solution instead of the use of ceramic interconnects. These steels form an oxide layer (chrornia) which protects the interconnect from the exterior environment, but is an electrical insulator. One solution envisaged in this work is the deposition of a reactive element oxide coating, that slows down the formation of the oxide layer and that increases its electric conductivity. The oxide layer, formed at high temperature on the uncoated alloys, is mainly composed of chromia; it grows in accordance …

Materials scienceoxidationChromia-forming alloy; Electrical resistivity; MOCVD; Oxidation; Screen-printing; SOFC interconnect; Renewable Energy Sustainability and the Environment; Energy Engineering and Power Technology; Physical and Theoretical Chemistry; Electrical and Electronic EngineeringAlloyOxideEnergy Engineering and Power Technology02 engineering and technologyengineering.material010402 general chemistry01 natural scienceschemistry.chemical_compoundElectrical resistance and conductanceCoatingchromia-forming alloyElectrical resistivity and conductivitySOFC interconnectRenewable EnergyCeramicElectrical and Electronic EngineeringPhysical and Theoretical ChemistryComposite materialSustainability and the EnvironmentRenewable Energy Sustainability and the EnvironmentMetallurgy[CHIM.MATE]Chemical Sciences/Material chemistry021001 nanoscience & nanotechnologyscreen-printingChromia0104 chemical sciences[CHIM.THEO]Chemical Sciences/Theoretical and/or physical chemistrychemistry13. Climate actionvisual_art[ CHIM.MATE ] Chemical Sciences/Material chemistry[ CHIM.THEO ] Chemical Sciences/Theoretical and/or physical chemistryMOCVDengineeringvisual_art.visual_art_mediumSolid oxide fuel cell0210 nano-technologyelectrical resistivity
researchProduct

Colloidal lithography and Metal-Organic Chemical Vapor Deposition process integration to fabricate ZnO nanohole arrays

2010

A complete set up of optimal process conditions for an effective colloidal lithography/catalyst assisted MOCVD process integration is presented. It mainly focuses on the determination of the deposition temperature threshold for ZnO Metal-Organic Chemical Vapour Deposition (MOCVD) as well as the concentration of metal-organic silver (Ag) catalyst. Indeed, the optimization of such process parameters allows to tailor the ZnO film morphology in order to make the colloidal lithography/catalyst assisted MOCVD approach a valuable bottom up method to fabricate bi-dimensional ordered ZnO nanohole arrays. (C) 2010 Elsevier B.V. All rights reserved.

Materials sciencezinc oxide; Nanowires and nanohole arrays; Colloidal lithographyMetals and AlloysNanowirezinc oxideNanotechnologyZnO; Catalyst; Nanowires; Nanohole array; Colloidal lithography; MOCVDSurfaces and InterfacesChemical vapor depositionSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsCatalysisNanowireNanohole arrayScientific methodProcess integrationMOCVDMaterials ChemistryNanowires and nanohole arraysZnOColloidal lithographyMetalorganic vapour phase epitaxyCatalystThin filmLithography
researchProduct

Correlation between Zn vacancies and photoluminescence emission in ZnO films.

2006

Photoluminescence and positron annihilation spectroscopy have been used to characterize and identify vacancy-type defects produced in ZnO films grown on sapphire by metal-organic chemical-vapor deposition. The photoluminescence of the samples in the near band edge region has been studied, paying particular attention to the emission at 370.5 nm (3.346 eV). This emission has been correlated to the concentration of Zn vacancies in the films, which has been determined by positron annihilation spectroscopy. Jesus.Zuniga@uv.es Vicente.Munoz@uv.es

PhotoluminescenceMaterials scienceAstrophysics::High Energy Astrophysical PhenomenaEdge regionAnalytical chemistrySemiconductor thin filmsGeneral Physics and AstronomyPositron annihilation spectroscopyCondensed Matter::Materials Science:FÍSICA [UNESCO]Zinc compoundsMetalorganic vapour phase epitaxyDeposition (law)Positron annihilationCondensed matter physicsCondensed Matter::OtherPhysicsWide-bandgap semiconductorpositron annihilationUNESCO::FÍSICACacancies (crystal)II-VI semiconductorsWide band gap semiconductorsZn vacanciesMOCVDSapphireZnOphotoluminescenceZinc compounds ; II-VI semiconductors ; Wide band gap semiconductors ; Semiconductor thin films ; Positron annihilation ; Cacancies (crystal) ; MOCVD
researchProduct

Optical characterization of Mg-doped GaN films grown by metalorganic chemical vapor phase deposition

2000

Scanning electron microscopy, micro-Raman, and photoluminescence (PL) measurements are reported for Mg-doped GaN films grown on (0001) sapphire substrates by low-pressure metalorganic chemical vapor phase deposition. The surface morphology, structural, and optical properties of GaN samples with Mg concentrations ranging from 1019 to 1021 cm−3 have been studied. In the scanning micrographs large triangular pyramids are observed, probably due to stacking fault formation and three-dimensional growth. The density and size of these structures increase with the amount of magnesium incorporated in the samples. In the photoluminescence spectra, intense lines were found at 3.36 and 3.31 eV on the tr…

PhotoluminescenceMaterials scienceIII-V semiconductorsScanning electron microscopeAnalytical chemistryGeneral Physics and AstronomySemiconductor thin filmsChemical vapor depositionStacking faultsSurface topographysymbols.namesake:FÍSICA [UNESCO]MagnesiumGallium compounds ; III-V semiconductors ; Wide band gap semiconductors ; Magnesium ; Semiconductor thin films ; MOCVD coatings ; Scanning electron microscopy ; Raman spectra ; Photoluminescence ; Surface composition ; Surface topography ; Stacking faults ; Inclusions ; ExcitonsPhotoluminescenceWurtzite crystal structureDopingUNESCO::FÍSICAGallium compoundsWide band gap semiconductorsMOCVD coatingsSurface compositionInclusionssymbolsSapphireExcitonsRaman spectraRaman spectroscopyScanning electron microscopyStacking fault
researchProduct

Structural characterization of a-plane Zn1−xCdxO (0 < x <0.085) thin films grown by metal-organic vapor phase epitaxy.

2006

Zn1−xCdxO(11math0) films have been grown on (01math2) sapphire (r–plane) substrates by metal-organic vapor phase epitaxy. A 800-nm-thick ZnO buffer, deposited prior to the alloy growth, helps to prevent the formation of pure CdO. A maximum uniform Cd incorporation of 8.5 at. % has been determined by Rutherford backscattering spectrometry. Higher Cd contents lead to the coexistence of Zn1−xCdxO alloys of different compositions within the same film. The near band-edge photoluminescence emission shifts gradually to lower energies as Cd is incorporated and reaches 2.93 eV for the highest Cd concentration (8.5 at. %). The lattice deformation, due to Cd incorporation, has been described using a n…

PhotoluminescenceMaterials scienceRutherford backscatteringCadmium compoundsUNESCO::FÍSICAAnalytical chemistrySemiconductor epitaxial layersGeneral Physics and AstronomyII-VI semiconductorsSurface structureChemical vapor depositionRutherford backscattering spectrometryEpitaxyVapour phase epitaxial growthCrystallographyLattice constantZinc compounds ; Cadmium compounds ; II-VI semiconductors ; MOCVD ; Vapour phase epitaxial growth ; Semiconductor epitaxial layers ; Rutherford backscattering ; Photoluminescence ; Surface structure ; Buffer layers:FÍSICA [UNESCO]MOCVDSapphireBuffer layersMetalorganic vapour phase epitaxyZinc compoundsThin filmPhotoluminescence
researchProduct